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45° AOI Ultrafast Chirped Mirrors

UltraFast Innovations (UFI) 상세 정보 보기
×
  • 높은 반사율과 음의 Group Delay Dispersion (GDD)
  • 45° 입사각에서의 분산 보정 및 빔 압축에 적합
  • Ti:sapphire 등의 Femtosecond Laser를 위한 디자인

공통 스펙

Typical Applications:
Pulse Compression @ 45° of Ti:sapphire Ultrafast Lasers
Wedge (arcmin):
<10
Clear Aperture (%):
80
Back Surface:
Commercial Polish
Reflection at DWL (%):
99.8
Coating Specification:
Ravg >99.8% @ 725 - 1000nm (P-Polarization)
GDD Specification:
-70fs2 @ 725 - 1000nm (P-Polarization)
Wavelength Range (nm):
725 - 1000
Irregularity (P-V) @ 632.8nm:
λ/10
Coating Type:
Dielectric
Coating:
Ultrafast Chirped (725-1000nm)
Design Wavelength DWL (nm):
800
Thickness (mm):
6.35 ±0.2
Angle of Incidence (°):
45
Substrate:
Fused Silica (Corning 7980)
Damage Threshold, By Design:
0.2 J/cm2 @ 800nm, 50fs, 1kHz, 100μm Beam Diameter
 Wavelength Range (nm)  DWL (nm) Dia. (mm)  Thickness (mm)  AOI (°)  제품 비교하기   재고 번호   가격(부가세 별도)  구입하기
725 - 1000 800 12.70 6.35 45 #12-420 KRW 567,000 수량 4+ KRW 500,300   견적 요청  
  • 3~5일내 배송
    ×
 
725 - 1000 800 25.40 6.35 45 #12-421 KRW 1,116,500 수량 4+ KRW 983,100   견적 요청  
  • 3~5일내 배송
    ×
 

45° AOI Ultrafast Chirped Mirrors는 빔 전송 중 극초단 빔의 압축 또는 분산 보정을 위해 45°의 입사각으로 설계되었습니다. 이 극초단 미러는 음의 GDD와 725 - 1000nm에서 높은 반사율을 제공하도록 최적화된 다층의 magnetron sputtered coating 처리가 되어 있습니다. 또한 표면 품질이 높은 레이저 등급의 기판으로 제조되어 빛의 산란 및 불균일성은 최소화하면서 반사된 극초단 펄스로 광학적 파워와 밀도를 유지할 수 있습니다. 45° AOI Ultrafast Chirped Mirrors는 빔 전송 중 Ti:sapphire 등의 펨토세컨드 레이저에서 방출되는 극초단 펄스의 압축 및 분산 보정에 사용하기 적합합니다. 사용자 지정 각도, 크기 또는 설계 파장에 맞는 Ultrafast Chirped Mirror가 필요한 경우에는 당사로 문의 바랍니다.

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