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Extreme Ultraviolet (EUV) Spherical Mirrors

TECHSPEC® Extreme Ultraviolet (EUV) Spherical Mirrors

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  • 초강력 연마된 기판에 Mo/Si 다층 코팅
  • 13.5nm에서 최대 반사율 제공
  • 극자외선(EUV) 포커싱 용도로 설계
  • 좁은 통과 대역으로 HHG 용도에 적합
DWL (nm) Dia. (mm) EFL (mm)  Coating   제품 비교하기   재고 번호   가격(부가세 별도)  구입하기
13.5 25.40 250.00 Mo/Si Multilayer
Top Layer: Silicon
#11-730 KRW 5,727,500   견적 요청  
  • 품절/문의요망
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Extreme Ultraviolet (EUV) Spherical Mirrors는 다층의 Mo/Si 코팅 처리가 되어 있어 13.5nm에서 60%가 넘는 반사율을 제공합니다. 이 제품은 5°의 입사각을 위해 설계되었으며 비편광 EUV 레이저 광원을 포커싱하는 데 사용됩니다. 표면 거칠기는 3Å RMS 미만으로서 산란을 최소화합니다. 이러한 미러는 파장이 길수록 더 많은 산란이 발생하는 EUV 파장에 반드시 필요한 광학 부품입니다. EUV Spherical Mirrors는 대략 0.5nm의 매우 좁은 통과 대역을 가지고 있어 고고조파 생성(HHG: high harmonic generation) 용도에서 13.5nm의 관심 고조파만 반사시킬 수 있습니다. EUV spherical mirrors의 주된 용도로는 CDI(Coherent Diffractive Imaging), EUV 이미징 및 EUV 나노머시닝이 있습니다.

참고: 각 미러의 생산 시행 견본에서 수집된 테스트 데이터 포함.

Filter

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EO의 글로벌 제조 설비

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Clear Aperture (CA)

Laser

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Surface Quality

 
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