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10-25nm, 50.8mm Dia, EUV/IR Dichroic Filter

Extreme Ultraviolet (EUV) Dichroic Filters

Extreme Ultraviolet (EUV) Dichroic Filters

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KRW 7,177,500
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KRW 7,177,500
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제품 정보 다운로드
Diameter (mm):
50.80
Angle of Incidence (°):
78
Substrate: Many glass manufacturers offer the same material characteristics under different trade names. Learn More
Fused Silica (Corning 7980)
Coating:
Dielectric Multilayer AR
Reflection (%):
>35
Surface Quality:
20-10
Thickness (mm):
5.08 ±0.1
Type:
Dichroic Filter
Parallelism (arcmin):
<5
Dimensional Tolerance (mm):
+0.0/-0.2
Wavelength Range (nm):
10 - 25
Surface Figure, RMS:
<λ/10 @ 633nm

Regulatory Compliance

RoHS:
Certificate of Conformance:

제품군의 상세 설명

  • 높은 고조파 생성 시 NIR 레이저 광원에서 EUV 분리
  • 높은 손상 임계치에 맞게 설계
  • 10 – 40nm의 어플리케이션 지원
  • 기성품으로 이용 가능
  • 최소 주문 수량 미적용, 코팅 로트 비용 없음

Extreme Ultraviolet (EUV) Dichroic Filters는 beam separator로 알려진 제품으로서 EUV와 NIR 파장 사이에서 고효율 분리 성능을 제공함에 따라 높은 고조파를 생성하는 용도에 안성맞춤입니다. 용융 실리카 기판으로 제조되는 이 필터는 대안품인 Brewster’s angle beam separator 및 EUV filter보다 더 높은 출력의 레이저 파워를 지원합니다. 또한 10nm - 40nm의 넓은 대역폭 범위를 특징으로 합니다. 이 밖에도 높은 고조파 생성 외 EUV 리소그래피, EUV 나노머시닝, 간섭 회절 이미징, 극초단 펄스 생성을 지원하는 시스템에 사용할 수 있습니다.

Filter

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