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25.4mm Dia. 5°, 2μm Highly-Dispersive Broadband Ultrafast Mirror

UltraFast Innovations (UFI) 상세 정보 보기
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재고 #11-414 3~5일내 배송
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KRW 1,176,000
수량 1-3
KRW 1,176,000
수량 4+
KRW 1,036,800
가격(부가세 별도)
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제품 정보 다운로드
Type:
Laser Mirror
Typical Applications:
Thulium and Holmium Lasers
Wedge (arcmin):
10
Clear Aperture (%):
80
Back Surface:
Commercial Polish
Reflection at DWL (%):
>99.95
Reflectivity (Rp%):
99.9
Coating Specification:
Ravg >99.9% @ 2000 - 2200nm (p-polarization)
GDD Specification:
-1000fs2 @ 2000 - 2200nm (p-polarization)
Wavelength Range (nm):
2000 - 2200
Irregularity (P-V) @ 632.8nm:
λ/10
Coating Type:
Dielectric
Coating:
Chirped Ultrafast (2000-2200nm)
Design Wavelength DWL (nm):
2000
Diameter (mm):
25.40 +0.0/-0.1
Thickness (mm):
6.35 ±0.01
Angle of Incidence (°):
5
Substrate: Many glass manufacturers offer the same material characteristics under different trade names. Learn More
Fused Silica (Corning 7980)

Regulatory Compliance

RoHS 2015:
Certificate of Conformance:
Reach 235:

제품군의 상세 설명

  • 2000 - 2200nm 구간에서 99.9%가 넘는 반사율
  • 5° AOI에서 -1000fs2의 GDD
  • 툴륨 및 홀뮴 레이저의 펄스를 100fs 미만으로 압축하는 데 적합
  • 극초단 초고속 처프 코팅(Chirped Coating)

2μm Highly-Dispersive Broadband Ultrafast Mirrors는 intracavity 분산의 압축을 비롯해 툴륨(Tm)과 홀뮴(Ho) 레이저의 펄스를 압축하도록 설계된 제품으로서 초고속 처프 코팅을 특징으로 합니다. 이러한 미러는 5° AOI에서 높은 음수의 GDD(group delay dispersion)를 특징으로 하며 100fs 미만으로 펄스를 압축할 수 있습니다. 또한 2000 - 2200nm 구간(P-편광)에서 손실률이 낮은 99.9% 이상의 반사율과 99.95%가 넘는 절대 반사율을 제공합니다. 2μm Highly-Dispersive Broadband Mirrors는 검증된 GDD, 저손실, 뛰어난 스펙트럼 성능을 가지고 있기 때문에 2μm thin-disk laser oscillator 내에서 사용하기 안성맞춤입니다. 이와 같은 고분산 미러는 12.7mm와 25.4mm 두 개의 크기로 제공되며 펨토초(femtosecond) 레이저 시스템과의 결합에 이상적으로 사용할 수 있습니다.

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