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25.4mm Dia., 700 - 1100nm, Positive Dispersion Ultrafast Mirror

UltraFast Innovations (UFI) 상세 정보 보기

UltraFast Innovations (UFI) Positive Dispersion Ultrafast Mirrors

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재고 #17-069 품절/문의요망
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KRW 1,142,600
수량 1-9
KRW 1,142,600
수량 10+
KRW 1,031,000
가격(부가세 별도)
견적 요청
제품 정보 다운로드
Wedge (arcmin):
10
Clear Aperture (%):
80
Back Surface:
Commercial Polish
Coating Specification:
Ravg >99.5% @ 700 - 1100nm (5° AOI, p-polarization)
GDD Specification:
+100fs2 @ 700 - 1100nm (5° AOI, p-polarization)
Wavelength Range (nm):
700 - 1100
Irregularity (P-V) @ 632.8nm:
λ/10
Coating Type:
Dielectric
Coating:
Positive Dispersion (700-1100nm)
Design Wavelength DWL (nm):
700 - 1100
Diameter (mm):
25.40 +0.00/-0.05
Thickness (mm):
6.35 ±0.20
Angle of Incidence (°):
5
Substrate: Many glass manufacturers offer the same material characteristics under different trade names. Learn More
Fused Silica (Corning 7980)

Regulatory Compliance

RoHS 2015:
Certificate of Conformance:
Reach 235:

제품군의 상세 설명

UltraFast Innovations (UFI) Positive Dispersion Ultrafast Mirrors는 해당 파장 범위에서 사용되는 가장 일반적인 소재의 GDD와 동일한 부호를 갖는 양수 GDD를 제공합니다. 이러한 양의 chirped mirror는 하이브리드 프리즘/미러 컴프레서와 같은 chirped-pulsed amplifier system 및 펄스 압축 용도에 사용되며, 700 - 1100nm 사이의 S 및 P 편광에서 99.5%가 넘는 높은 반사율을 특징으로 합니다. 또한 소형의 외관을 유지하면서도 5°의 설계 입사각(AOI)에서 극초단 미러 간의 최대 반사 회수를 달성합니다. UltraFast Innovations (UFI) Positive Dispersion Ultrafast Mirrors는 열적 안정성이 우수한 용융 실리카 기판으로 제조되며 25.4mm의 직경을 가지고 있어 근적외선(NIR) 용도와의 결합이 용이합니다. 고객의 레이저 시스템에 맞춤형 크기, 파장 혹은 펄스 프로파일이 필요한 경우 당사로 문의 바랍니다.

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